Fluoroalcohol-Methacrylate Resists for 193 nm Lithography
スポンサーリンク
概要
Technical Association of Photopolymers, Japan | 論文
- Design of biointerface by nonequilibrium atmospheric plasma jets: approach from plasma susceptible polymers
- Alignment Control in Holographic Polymer Dispersed Liquid Crystal
- Fabrication of Multi Color Polymer EL Devices using the Photo-bleaching Method
- Molecular Recognition Gating Membranes Made by Plasma-Graft Polymerization
- Removal of Positive-tone Diazonaphthoquinone/Novolak Resist Using UV Laser lrradiation