Gate Depletion in WSi_x/Polysilicon Gate Stack and Effects of Phosphorus Ion Implantation

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-05-15

著者

• Cho Won-ju

  Fundamental Technology Department Basic Rrsearch Laboratory

• Lee Seongjae

  Fundamental Technology Department Basic Rrsearch Laboratory

関連論文

• Gate Depletion in WSi_x/Polysilicon Gate Stack and Effects of Phosphorus Ion Implantation
• Gate Depletion in WSix/Polysilicon Gate Stack and Effects of Phosphorus Ion Implantation

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