Two-step Process for the Metalorganic Chemical Vapor Deposition Growth of High Quality AIN Films on Sapphire

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概要

• 論文の詳細を見る
• 2003-04-15

著者

• PADUANO Qing

  Air Force Research Laboratory

• WEYBURNE David

  Air Force Research Laboratory

関連論文

• The Energy Band Gap of Al_xGa_N
• Two-step Process for the Metalorganic Chemical Vapor Deposition Growth of High Quality AIN Films on Sapphire
• Optimized Coalescence Method for the Metalorganic Chemical Vapor Deposition (MOCVD) Growth of High Quality Al-Polarity AlN Films on Sapphire

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