Micro Arc Monitoring by Detecting Charge Build-Up on Glass Surface of Viewing Port due to Plasma Dispersion in Plasma Processing Equipment

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 2003-02-15

著者

• Takeshita Masayoshi

  Tokyo Cathode Laboratory Co. Inc.

• Yasaka Mitsuo

  Tokyo Cathode Laboratory Co. Inc.

• MIYAGAWA Ryuji

  Kumamoto Industrial Research Institute

関連論文

• Monitoring of Two-Dimensional Plasma Uniformity with Electrostatic Probing of Oxidized Wafer Surface : Semiconductors
• Detection of Supersonic Waves Emitted from Anomalous Arc Discharge in Plasma Processing Equipment
• Micro Arc Monitoring by Detecting Charge Build-Up on Glass Surface of Viewing Port due to Plasma Dispersion in Plasma Processing Equipment
• Micro Arc Monitoring by Detecting Charge Build-Up on Glass Surface of Viewing Port due to Plasma Dispersion in Plasma Processing Equipment

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