Detection of Supersonic Waves Emitted from Anomalous Arc Discharge in Plasma Processing Equipment
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概要
- 論文の詳細を見る
We report, for the first time, a new method of monitoring anomalous arc discharge in plasma processing equipment by detecting supersonic waves emitted at a discharge site. The supersonic wave is detected with an acoustic transducer attached to the outside surface of a plasma chamber. It is demonstrated that the method can detect anomalous discharge both in direct-current (DC) and radio-frequency (RF) plasma equipment. The results suggest that the method can find the location of anomalous discharge sites in the processing chamber.
- 社団法人応用物理学会の論文
- 2000-12-15
著者
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YASAKA Mitsuo
Tokyo Cathode Laboratory Co., Inc.
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TAKESHITA Masayoshi
Tokyo Cathode Laboratory Co., Inc.
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Takeshita M
Tokyo Cathode Lab. Co. Inc. Kumamoto Jpn
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Takeshita Masayoshi
Tokyo Cathode Laboratory Co. Inc.
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Yasaka M
Tokyo Cathode Lab. Co. Inc. Kumamoto Jpn
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Yasaka Mitsuo
Tokyo Cathode Laboratory Co. Inc.
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MIYAGAWA Ryuji
Kumamoto Industrial Research Institute
関連論文
- Monitoring of Two-Dimensional Plasma Uniformity with Electrostatic Probing of Oxidized Wafer Surface : Semiconductors
- Detection of Supersonic Waves Emitted from Anomalous Arc Discharge in Plasma Processing Equipment
- Micro Arc Monitoring by Detecting Charge Build-Up on Glass Surface of Viewing Port due to Plasma Dispersion in Plasma Processing Equipment
- Micro Arc Monitoring by Detecting Charge Build-Up on Glass Surface of Viewing Port due to Plasma Dispersion in Plasma Processing Equipment