Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-02-15
著者
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Nakano Kazushi
Materials Laboratories Atsugi Technology Center Sony Corporation
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Gosain Dharam
Materials Laboratories Yokohama Research Ceter Sony Corporation
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Machida Akio
Display Technology Laboratories Yokohama Research Center Sony Corporation
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Fujino Toshio
Materials Laboratories Atsugi Technology Center Sony Corporation
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HITSUDA Yukihisa
Materials Laboratories, Atsugi Technology Center, Sony Corporation
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SATO Junichi
Materials Laboratories, Atsugi Technology Center, Sony Corporation
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Hitsuda Yukihisa
Materials Laboratories Atsugi Technology Center Sony Corporation
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Sato Junichi
Materials Laboratories Atsugi Technology Center Sony Corporation
関連論文
- Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate
- Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate