Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate

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概要

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• We investigated the texture of excimer-laser crystallized Si film. For the first time, Si thin films with more than 96% (100) texture have been produced using excimer-laser crystallization of a-Si on a glass substrate. The (100) textured film has rectangular grains with edges parallel to the (110) direction. Results of scanning electron microscopy (SEM), electron backscatter diffraction patterns (EBSP), X-ray diffraction and transmission electron microscopy (TEM) are presented. The results are interpreted on the basis of Si/SiO2 interface energy and a new grain-selection model.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 2003-02-15

著者

• Nakano Kazushi

  Materials Laboratories Atsugi Technology Center Sony Corporation

• Gosain Dharam

  Materials Laboratories Yokohama Research Ceter Sony Corporation

• Machida Akio

  Display Technology Laboratories Yokohama Research Center Sony Corporation

• Fujino Toshio

  Materials Laboratories Atsugi Technology Center Sony Corporation

• Hitsuda Yukihisa

  Materials Laboratories Atsugi Technology Center Sony Corporation

• Sato Junichi

  Materials Laboratories Atsugi Technology Center Sony Corporation

• Gosain Dharam

  Materials Laboratories, Yokohama Research Center, Sony Corporation, 2-1-1 Shinsakuragaoka, Hodogaya-ku, Yokohama 240-0036, Japan

• Machida Akio

  Display Technology Laboratories, Yokohama Research Center, Sony Corporation, 2-1-1 Shinsakuragaoka, Hodogaya-ku, Yokohama 240-0036, Japan

• Fujino Toshio

  Materials Laboratories, Atsugi Technology Center, Sony Corporation, 4-14-4 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan

• Nakano Kazushi

  Materials Laboratories, Atsugi Technology Center, Sony Corporation, 4-14-4 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan

関連論文

• Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate
• Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate

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