Plasma Diagnostics and Characterizations of Al-Doped ZnO Films Deposited with Low Temperature Sputtering Process (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
スポンサーリンク
概要
著者
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Choi Yoon
Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Shim Byeong
Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Kim Hye
Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Han Jeon
Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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- Plasma Diagnostics and Characterizations of Al-Doped ZnO Films Deposited with Low Temperature Sputtering Process
- Plasma Diagnostics and Characterizations of Al-Doped ZnO Films Deposited with Low Temperature Sputtering Process (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)