Plasma Diagnostics and Characterizations of Al-Doped ZnO Films Deposited with Low Temperature Sputtering Process
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概要
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Facing targets sputtering (FTS) is known to be one of the promising magnetron sputtering systems for low temperature processes, because of the significant reduction of damage in the film structure, by the suppression of impinging high energy particles. In this study, FTS was compared with conventional magnetron sputtering (CMS), by various plasma diagnostics methods and film analysis. The sputtering target used was ZnO:Al (2%). OES was used to study the emission spectroscopy of process plasma. Ion current densities and the temperatures on the substrate were measured, to compare FTS with CMS. A coplanar-type Fabry--Perot interferometer (FPI) was utilized to measure the gas temperatures of Zn atoms, by Doppler broadening of the corresponding emission lines. Gas temperatures of Zn of FTS were measured to be lower, in the range of 200--300 K, compared with those of CMS. Film analysis showed that quality films can be synthesized at low temperature with rf powered FTS.
- 2013-11-25
著者
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Choi Yoon
Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Shim Byeong
Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Kim Hye
Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Han Jeon
Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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