Damage Recovery by Reductive Chemistry after Methanol-Based Plasma Etch to Fabricate Magnetic Tunnel Junctions (Special Issue : Dry Process)
スポンサーリンク
概要
著者
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Ohno Hideo
Center For Spintronics Integrated Systems Tohoku University
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Ikeda Shoji
Center For Spintronics Integrated Systems Tohoku University
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Kinoshita Keizo
Center for Spintronics Integrated Systems, Tohoku University
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Yamamoto Tadashi
ULVAC, Inc., Susono, Shizuoka 410-1231, Japan
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Honjo Hiroaki
Center for Spintronics Integrated Systems, Tohoku University, Sendai 980-8577, Japan
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Kasai Naoki
Center for Spintronics Integrated Systems, Tohoku University, Sendai 980-8577, Japan
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- Damage Recovery by Reductive Chemistry after Methanol-Based Plasma Etch to Fabricate Magnetic Tunnel Junctions (Special Issue : Dry Process)
- Dependence of Magnetic Anisotropy in Co_Fe_B_ Free Layers on Capping Layers in MgO-Based Magnetic Tunnel Junctions with In-Plane Easy Axis
- Design of a Nine-Transistor/Two-Magnetic-Tunnel-Junction-Cell-Based Low-Energy Nonvolatile Ternary Content-Addressable Memory
- Time-Resolved Switching Characteristic in Magnetic Tunnel Junction with Spin Transfer Torque Write Scheme
- Electric Field Effect on Magnetization of an Fe Ultrathin Film
- Current-Induced Domain Wall Motion in Perpendicularly Magnetized Co/Ni Nanowire under In-Plane Magnetic Fields
- High-Density and Low-Power Nonvolatile Static Random Access Memory Using Spin-Transfer-Torque Magnetic Tunnel Junction
- CoNi Films with Perpendicular Magnetic Anisotropy Prepared by Alternate Monoatomic Layer Deposition
- Fabrication of a Magnetic Tunnel Junction-Based 240-Tile Nonvolatile Field-Programmable Gate Array Chip Skipping Wasted Write Operations for Greedy Power-Reduced Logic Applications