Influence of Interfacial Tantalum Oxynitride on Resistive Switching of Cu/Cu-SiO/TaN
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Jou Shyankay
Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan, R.O.C.
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Han Ming-En
Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan, R.O.C.
関連論文
- Effect of Pt and Al Electrodes on Resistive Switching Properties of Sputter-Deposited Cu-Doped SiO2 Film
- Influence of Interfacial Tantalum Oxynitride on Resistive Switching of Cu/Cu-SiO/TaN