Investigation of Optical and Electrochromic Properties of Tungsten Oxide Deposited with Horizontal DC and DC Pulse Magnetron Sputtering
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
-
Chen Hsi-Chao
Graduate School of Optoelectronics, National Yunlin University of Science and Technology, Yunlin 640, Taiwan
-
Jan Der-Jun
Physics Division, Institute of Nuclear Energy Research, Taoyuan 32546, Taiwan
-
Chen Chien-Han
Graduate School of Optoelectronics, National Yunlin University of Science and Technology, Yunlin 64002, Taiwan
関連論文
- Modulating the Residual Stress of Ion-Assisted TiO2 Films during Annealing with Film Thickness and Substrate Temperature
- Effects of Re-baking and Substrate Temperature on Optical Properties and Residual Stress of Ion-Assisted Deposition TiO2 Thin Film
- Investigation of Optical and Electrochromic Properties of Tungsten Oxide Deposited with Horizontal DC and DC Pulse Magnetron Sputtering