In-situ X-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO on Silicon Substrate
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概要
著者
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An Ki-seok
Thin Film Materials Laboratory Korea Research Institute Of Chemical Technology
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Park Chong-Yun
BK21 Physics Research Division and Center for Nanotubes and Nanostructured Composites (CNNC), Sungkyunkwan University, Suwon 440-746, Republic of Korea
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Kim Yooseok
BK21 Physics Research Division and Center for Nanotubes and Nanostructured Composites (CNNC), Sungkyunkwan University, Suwon 440-746, Republic of Korea
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Lee Seung
BK21 Physics Research Division and Center for Nanotubes and Nanostructured Composites (CNNC), Sungkyunkwan University, Suwon 440-746, Republic of Korea
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Jeon Cheolho
BK21 Physics Research Division and Center for Nanotubes and Nanostructured Composites (CNNC), Sungkyunkwan University, Suwon 440-746, Republic of Korea
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Jung Woosung
BK21 Physics Research Division, Department of Energy Science, Sungkyunkwan University, Suwon 440-746, Republic of Korea
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Kim Seok
Thin Film Material Research Team, Korea Research Institute of Chemical Technology, Yuseong P. O. Box 107, Daejon 305-600, Republic of Korea
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