Analysis of Peeling Mechanism in Annealed Tungsten Silicide Thin Films
スポンサーリンク
概要
著者
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Chen Chun-Chi
Powerchip Technology Corporation, Hsinchu, Taiwan 300, R.O.C.
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Chien Hung-Ju
Powerchip Technology Corporation, Hsinchu, Taiwan 300, R.O.C.
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Chuang Ming-Jie
Powerchip Technology Corporation, No. 12 Li-Isin Rd. 1, Hsinchu Science Park, Hsinchu, Taiwan 300, R.O.C.
関連論文
- Analysis of Peeling Mechanism in Annealed Tungsten Silicide Thin Films
- Analysis of P-Doped Polycrystalline Silicon Missing of W-Polycide Gate for 2X nm NAND Flash
- Analysis of P-Doped Polycrystalline Silicon Missing of W-Polycide Gate for 2X nm NAND Flash