Effect of maleimide compounds on pattern-forming property of photosensitive polyimide based on negative-tone reaction development patterning
スポンサーリンク
概要
著者
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OYAMA Toshiyuki
Faculty of Engineering, Department of Advanced Materials Chemistry, Yokohama National University
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Takahashi Akio
Hitachi. Ltd. Advanced Research Laboratory
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Takahashi Akio
Yokohama National Univ. Yokohama Jpn
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Oyama Toshiyuki
Yokohama National Univ. Yokohama Jpn
関連論文
- Effect of maleimide compounds on pattern-forming property of photosensitive polyimide based on negative-tone reaction development patterning
- Examination of pattern-forming conditions in negative-tone reaction development patterning
- Development of chemically amplified reaction development patterning
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