Point spread function for the calculation of acid distribution in chemically amplified resists used for electron-beam lithography
スポンサーリンク
概要
Japan Society of Applied Physics | 論文
- Simulation of atomic-scale ultralow friction of graphite/C60/graphite interface along direction
- Ultrathin Oxynitride Films Formed by Using Pulse-Time-Modulated Nitrogen Beams
- A Steady Operation of n-Type Organic Thin-Film Transistors with Cyano-Substituted Distyrylbenzene Derivative
- Characterization of Depletion Layer using Photoluminescence Technique
- Development of ^Eu Time-Domain Interferometry and Its Application for the Study of Slow Dynamics in Ionic Liquids