Contact-Hole Etching with NH3-Added C5F8 Pulse-Modulated Plasma

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Yokoyama Shin

  Hiroshima Univ. Hiroshima Jpn

関連論文

• Design and Simulation of Inertial Force Sensor Using Mach-Zehnder Interferometer with Optical Waveguides Made of Crystal Silicon
• Contact-Hole Etching with NH3-Added C5F8 Pulse-Modulated Plasma

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