Laser Flash Photolysis Studies on Chemically Amplified Resists(1)Femtosecond Laser Flash Photolysis of Diphenyliodonium Salts

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Tagawa S

  Osaka Univ. Osaka

関連論文

• Dissolution Rate Analysis of ArF Resists Based on the Percolation Model
• Laser Flash Photolysis Studies on Chemically Amplified Resists(1)Femtosecond Laser Flash Photolysis of Diphenyliodonium Salts
• Atomic Force Microscopy Study on the Dissolution Processes of Chemically Amplified Resists for KrF Excimer Laser Lithography
• Effects of Photoacid Generator Concentration and Post-Exposure Bake Temperature on Dissolution Behavior of ArF Excimer Laser Resists
• Nonhomogeneous Pattern Formation in the Dissolution Processes of Novolak-Diazonaphthoquinone Resists

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