Control of Surface Work Function by Depositing Insulating Oxide Capping Layers
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概要
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We have studied the work function modulation in pulsed laser deposited nonpolar MgO (100) and polar MgO (100) and LaAlO<inf>3</inf>(100) insulating oxide films on Nb:SrTiO<inf>3</inf>(100) and (111) substrates using Kelvin probe measurements. The work function modulation in MgO/Nb:SrTiO<inf>3</inf>is {\sim}1 eV, which may be understood by the ``electron compression model'', where the leaked-out electrons from Nb:SrTiO<inf>3</inf>surface are pushed back by MgO layer, reducing the surface dipole moment. By forming double insulating top layer in LaAlO<inf>3</inf>/nondoped SrTiO<inf>3</inf>/Nb:SrTiO<inf>3</inf>(100), we have realized the work function as low as {\sim}2.2 eV, which would be originated in the formation of high-density electrons at the LaAlO<inf>3</inf>/nondoped SrTiO<inf>3</inf>interface and can be very close to the top surface. The present results demonstrate that chemically stable oxides can be used as low work function devices employing heterostructure form.
- 2013-11-25
著者
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Susaki Tomofumi
Secure Materials Center, Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Hosono Hideo
Secure Materials Center, Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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