Layer-Transferred GaN Template by Ion Cut for Nitride-Based Light-Emitting Diodes
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概要
- 論文の詳細を見る
Layer transfer via ion-cut has been developed for GaN to fabricate multiple templates from a high-quality GaN wafer without compromising the crystallinity. Here, we report on the successful fabrication of 4-in. layer-transferred GaN on sapphire. A high quality epitaxial layer is also successfully grown despite the structural degradation in the transferred layer by hydrogen implantation. Fully packaged vertical light-emitting diodes grown on the template exhibit the peak external quantum efficiency of 48.6% and optical output power of 1.8 W at 220 A/cm<sup>2</sup>, suggesting that the template could serve as a low-cost substrate for high-performance nitride devices.
- The Japan Society of Applied Physicsの論文
- 2013-11-25
著者
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Choi Jun-Sung
New Business Division, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Kim-Lee Hyun-Joon
New Business Division, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Lim Sung-Keun
New Business Division, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Chung Roy
R&D Center, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Kim Donghyun
New Business Division, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Kim Kyoung-Jun
New Business Division, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Lee Bo-Hyun
R&D Center, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Jung Kyung
New Business Division, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Lee Won
New Business Division, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Park Bongmo
R&D Center, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Woo Kwangje
New Business Division, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
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Chung Roy
R&D Center, Samsung Corning Precision Materials Co., Ltd., Asan, Chungnam 336-725, Republic of Korea
関連論文
- Layer-Transferred GaN Template by Ion Cut for Nitride-Based Light-Emitting Diodes
- Layer-Transferred GaN Template by Ion Cut for Nitride-Based Light-Emitting Diodes