Strain Rate Controlled Nanoindentation Examination and Incipient Plasticity in Bulk GaN Crystal
スポンサーリンク
概要
- 論文の詳細を見る
Yield shear stress dependence on dislocation density and crystal orientation was studied in bulk GaN crystals by nanoindentation examination. The yield shear stress decreased with increasing dislocation density, and it decreased with decreasing nanoindentation strain-rate. It reached and coincided at 11.5 GPa for both quasi-static deformed c-plane (0001) and m-plane (10\bar{1}0) GaN. Taking into account theoretical Peierls--Nabarro stress and yield stress for each slip system, these phenomena were concluded to be an evidence of heterogeneous mechanism associated plastic deformation in GaN crystal. Transmission electron microscopy and molecular dynamics simulation also supported the mechanism with obtained r-plane (\bar{1}012) slip line right after plastic deformation, so called pop-in event. The agreement of the experimentally obtained atomic shuffle energy with the calculated twin boundary energy suggested that the nucleation of the local metastable twin boundary along the r-plane concentrated the indentation stress, leading to an r-plane slip.
- 2013-08-25
著者
-
Nowak Roman
Nordic Hysitron Laboratory, Department of Materials Science, School of Chemical Technology, Aalto University, FI-00076 Aalto, Finland
-
Fujikane Masaki
Device Module Development Center, Corporate R&D Division, Panasonic Corporation, Moriguchi, Osaka 570-8501, Japan
-
Yokogawa Toshiya
Device Module Development Center, Corporate R&D Division, Panasonic Corporation, Moriguchi, Osaka 570-8501, Japan
-
Nagao Shijo
NTNU Nanomechanical Laboratory, Department of Structural Engineering, Norwegian University of Science and Technology (NTNU), 7491 Trondheim, Norway
-
Fujikane Masaki
Device Module Development Center, Corporate R&D Division, Panasonic Corporation, Moriguchi, Osaka 570-8501, Japan
-
Yokogawa Toshiya
Device Module Development Center, Corporate R&D Division, Panasonic Corporation, Moriguchi, Osaka 570-8501, Japan
関連論文
- Low Contact Resistance P-Type Electrode for Nonpolar m-Plane GaN
- Strain Rate Controlled Nanoindentation Examination and Incipient Plasticity in Bulk GaN Crystal
- Impedance Spectroscopy Structural Analysis: Ca-Dopant Segregation in (Pb0.75Ba0.25)(Zr0.70Ti0.30)O3