Direct Writing of Shape-Controlled Nanodot Array by Two-Photon Nanolithography Using Elliptical Beam
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概要
- 論文の詳細を見る
We propose a method to direct writing of a shape-controlled nanodot array by two-photon nanolithography (TPNL). An elliptical nanodot with a minor axis diameter of 50 nm was realized using an AR-N 4340 photoresist by employing a slit to achieve the elliptical beam. Theoretical simulations were carried out to estimate the feature size of nanostructures. The adjustments of the ellipticity and orientation of nanodot were investigated. Furthermore, we fabricated elliptical and rectangular nanodot arrays on a large scale. This study would provide evidence for fabricating shape-varied nanodot arrays in the fields of plasmonics and photonics by the TPNL.
- 2013-06-25
著者
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Dong Xian-zi
Laboratory Of Organic Nanophotonics Technical Institute Of Physics And Chemistry Chinese Academy Of
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Duan Xuan-ming
Laboratory Of Organic Nanophotonics Technical Institute Of Physics And Chemistry Chinese Academy Of
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Zhao Zhen-Sheng
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China
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Cao Hong-Zhong
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China
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Zheng Mei-Ling
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China
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Jin Feng
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China
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Duan Xuan-Ming
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China
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Dong Xian-Zi
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China
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ZHAO Zhen-Sheng
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
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JIN Feng
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
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DONG Xian-Zi
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
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DUAN Xuan-Ming
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
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CAO Hong-Zhong
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
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- Direct Writing of Shape-Controlled Nanodot Array by Two-Photon Nanolithography Using Elliptical Beam
- Direct Writing of Shape-Controlled Nanodot Array by Two-Photon Nanolithography Using Elliptical Beam