Direct Writing of Shape-Controlled Nanodot Array by Two-Photon Nanolithography Using Elliptical Beam
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概要
- 論文の詳細を見る
- 2013-06-25
著者
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Zheng Mei-Ling
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China
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ZHAO Zhen-Sheng
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
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JIN Feng
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
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DONG Xian-Zi
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
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DUAN Xuan-Ming
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
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CAO Hong-Zhong
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
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- Direct Writing of Shape-Controlled Nanodot Array by Two-Photon Nanolithography Using Elliptical Beam
- Direct Writing of Shape-Controlled Nanodot Array by Two-Photon Nanolithography Using Elliptical Beam