Effect of the Active Layer Thickness and Temperature on the Switching Kinetics of GeS
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概要
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In this paper, the effect of the active layer thickness and temperature on the switching kinetics of GeS<inf>2</inf>-based conductive bridge memories is addressed through electrical characterization. Results are explained in terms of a thermally and field driven ion hopping model for reversible resistance switching. The combined analysis reveals that at high temperature the set voltage and the set resistance decrease. Furthermore, the study suggests that applying the same reset condition, for GeS<inf>2</inf>thicknesses lower than 50 nm, the conductive filament is almost dissolved, while for thicker layers a portion of the filament still remains.
- 2013-04-25
著者
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Dahmani Faiz
Altis Semiconductor, 224 Bd. John F Kennedy, Corbeil Essonnes 91105, France
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Bernard Mathieu
CEA,LETI,MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
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Salvo Barbara
CEA,LETI,MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
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Longnos Florian
ALTIS Semiconductor, 224 Bd John Kennedy, F-91105 Corbeil Essonnes Cedex, France
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Palma Giorgio
CEA,LETI,MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
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Vianello Elisa
CEA,LETI,MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
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Molas Gabriel
CEA,LETI,MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
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Cagli Carlo
CEA,LETI,MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
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Guy Jérémy
CEA,LETI,MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
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Reyboz Marina
CEA,LETI,MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
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Carabasse Catherine
CEA,LETI,MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
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Bretegnier Damien
ALTIS Semiconductor, 224 Bd John Kennedy, F-91105 Corbeil Essonnes Cedex, France
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Liebault Jacques
ALTIS Semiconductor, 224 Bd John Kennedy, F-91105 Corbeil Essonnes Cedex, France
関連論文
- Effect of Seed Layer on Room Temperature Tunnel Magnetoresistance of MgO Barriers Formed by Radical Oxidation in IrMn-Based Magnetic Tunnel Junctions
- Effect of the Active Layer Thickness and Temperature on the Switching Kinetics of GeS