Effect of Seed Layer on Room Temperature Tunnel Magnetoresistance of MgO Barriers Formed by Radical Oxidation in IrMn-Based Magnetic Tunnel Junctions
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NiFe-seeded magnetic tunnel junctions (MTJs) of IrMn/CoFe/MgO/CoFeB were successfully formed by radically oxidizing a thin Mg layer. Room temperature (RT) tunnel magnetoresistance (TMR) of up to 211\pm 10% was obtained and found to be strongly dependent on the thickness of the NiFe seed layer. High resolution transmission microscopy (HRTEM), atomic force microscopy (AFM), X-ray diffraction (XRD), and magneto-optic Kerr effect (MOKE) analyses performed on NiFe/IrMn bilayer systems revealed that the IrMn(111)-fcc texture, grain size, surface roughness (rms), and exchange-biasing field (H_{\text{ex}}) were strongly affected by the thickness of the NiFe seed layer. A critical NiFe thickness (t_{\text{c}} \approx 12 Å) was found: For t_{\text{NiFe}}\leq t_{\text{c}}, the IrMn showed a very poor (111)-fcc texture with reduced grain size, very smooth surface, and reduced H_{\text{ex}}. For t_{\text{NiFe}} > t_{\text{c}}, the IrMn showed a complete opposite behavior: much enhanced (111)-fcc texture with larger grain size, rougher surface, and larger H_{\text{ex}}. For MTJ-based IrMn systems, a striking behavior is reported: larger TMRs and lower tunnel junction resistance (\mathit{RA}) products are obtained for t_{\text{NiFe}} \leq t_{\text{c}} while lower TMRs and larger \mathit{RA}s are obtained for t_{\text{NiFe}} > t_{\text{c}}.
- 2012-04-25
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関連論文
- Effect of Seed Layer on Room Temperature Tunnel Magnetoresistance of MgO Barriers Formed by Radical Oxidation in IrMn-Based Magnetic Tunnel Junctions
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