Less Reflective Sub-Wavelength Structure Formed on Textured Surface Using Nanosphere Mask

概要

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In this study, a new sub-wavelength structure was made on a textured surface by using nanolithography and reactive ion etching. By oxygen plasma hydrophilization and drop-coating processes, we were able to place nanosphere masks on the facet of the textured surface uniformly and then the textured surface was dry-etched into a nanowhisker structure. These nanowhiskers can absorb incident light efficiently, even if they are illuminated at large incident angles. When this proposed sub-wavelength structure was applied to a solar cell, a high photocurrent can be achieved. The short-circuit current of the solar cell with the proposed structure was improved by 15.32% compared with that of the solar cell with an antireflection layer. Furthermore, short-circuit current degradation due to angular dependence was minimal for the proposed solar cell. At the incident angle of 80°, the proposed solar cell achieved a 68.5% enhancement of the photocurrent relative to that of the solar cell equipped with the conventional sub-wavelength structure.
2013-01-25