Ion Conductivity of Ta2O5 Solid Electrolyte Thin Film Prepared by Combination Sputtering with Radio Frequency Oxygen Plasma Irradiation

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概要

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• In light of the need to simplify combination sputtering systems and to use them to fabricate thin-film electronic materials, we fabricated a Ta2O5 solid electrolyte thin-film that exhibits superior ion conductivity by using combination sputtering with RF oxygen plasma irradiation. The formation of Ta2O5 thin films using this technique was confirmed by Rutherford backscattering spectroscopy and the effectiveness of the resulting thin film as a solid electrolyte was demonstrated by its ion conductivity, which was determined by AC impedance measurement.

• 2012-02-25

著者

• Noguchi Daisuke

  Department Of Applied Chemistry Aichi Institute Of Technology

• Noguchi Daisuke

  Department of Chemical Science and Engineering, Miyakonojo National College of Technology, Miyakonojo, Miyazaki 885-8567, Japan

• Sei Fumihiro

  Honda Lock Mfg., Co., Ltd., Miyazaki 880-0293, Japan

• Higashimaru Yukie

  Department of Chemical Science and Engineering, Miyakonojo National College of Technology, Miyakonojo, Miyazaki 885-8567, Japan

• Kawano Yoshihiko

  Honda Lock Mfg. Co., Ltd., Miyazaki 880-0293, Japan

• Taneda Hiroshi

  Department of Chemical Science and Engineering, Miyakonojo National College of Technology, Miyakonojo, Miyazaki 885-8567, Japan

• Sei Fumihiro

  Honda Lock Mfg. Co., Ltd., Miyazaki 880-0293, Japan

関連論文

• Simultaneous Injection-Effective Mixing Analysis of Palladium
• Technique for High-Rate, Low-Temperature Deposition of TiO2 Photocatalytic Thin Film Using Radical-Assisted Sputtering
• Ion Conductivity of Ta2O5 Solid Electrolyte Thin Film Prepared by Combination Sputtering with Radio Frequency Oxygen Plasma Irradiation
• Photoinduced Hydrophilicity and Structural Evaluation of SiOx:OH/TiO2 Multilayer Films by DC Reactive Magnetron Sputtering

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