Technique for High-Rate, Low-Temperature Deposition of TiO2 Photocatalytic Thin Film Using Radical-Assisted Sputtering
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概要
- 論文の詳細を見る
We have developed a two-step deposition technique. In the first step, a TiO2 nucleus is formed on a SiO2 thin film by radical-assisted sputtering using reactive-mode sputtering and O2 radicals. The second step is a growth step where TiO2 is deposited at a high rate and at a low temperature on the nucleation layer using metallic-mode sputtering and O2 radicals. The results were evaluated by transmission electron microscopy. They demonstrate that this deposition method can form TiO2 thin films with high crystallinities from the growth boundary. The effectiveness of this method was also demonstrated by measuring the photocatalytic properties.
- 2011-01-25
著者
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Kodama Kazuya
Department Of Chemistry Faculty Of Science Okayama University Of Science
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Noguchi Daisuke
Department Of Applied Chemistry Aichi Institute Of Technology
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Sei Fumihiro
Honda Lock Mfg., Co., Ltd., Miyazaki 880-0293, Japan
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Eto Tomohiro
Department of Chemical Science and Engineering, Miyakonojo National College of Technology, Miyakonojo, Miyazaki 885-8567, Japan
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Higashimaru Yukie
Department of Chemical Science and Engineering, Miyakonojo National College of Technology, Miyakonojo, Miyazaki 885-8567, Japan
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Fukudome Shoji
Honda Lock Mfg., Co., Ltd., Miyazaki 880-0293, Japan
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Kawano Yoshihiko
Honda Lock Mfg., Co., Ltd., Miyazaki 880-0293, Japan
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Siono Ichiro
SHINCRON Co., Ltd., Yokohama 220-8680, Japan
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Kawano Yoshihiko
Honda Lock Mfg. Co., Ltd., Miyazaki 880-0293, Japan
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Sei Fumihiro
Honda Lock Mfg. Co., Ltd., Miyazaki 880-0293, Japan
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