Disappearance of Lowest-Order Transmission Resonance in Ag Film of Critical Thickness
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概要
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The quantum phenomenon of the transmission resonance can be observed in Ag films grown on a Si(111)$7{\times}7$ surface using scanning tunneling spectroscopy. It is found that the energy of the transmission resonance moves toward lower energy with increasing film thickness. The formula used is derived from quantum mechanics to demonstrate that this lowering in the transmission resonance energy is proportional to $(w+1)^{2}/w^{2}$, where $w$ is the number of atomic layers of film thickness. This relation is justified by experimental results, but only holds for thinner films. The formula also predicts that the lowest-order transmission resonance should disappear when the Ag film reaches its critical thickness. This disappearance of the transmission resonance has also been experimentally confirmed in the $dI/dV$ spectrum.
- 2011-08-25
著者
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Tsong Tien
Institute Of Physics Academia Sinica
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CHANG Chia-Seng
Institute of Microelectronics & Department of Electrical Engineering National Cheng Kung University
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Chu Pei-Hong
Department of Physics, Tunghai University, Taichung 407, Taiwan, R.O.C.
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Su Wei-Bin
Department of Physics, Tunghai University, Taichung 407, Taiwan, R.O.C.
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Hsiao Hsi-Lien
Department of Physics, Tunghai University, Taichung 407, Taiwan
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Lu Shin-Ming
Department of Physics, Tunghai University, Taichung 407, Taiwan, R.O.C.
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Hsiao Hsi-Lien
Department of Physics, Tunghai University, Taichung 407, Taiwan, R.O.C.
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Huang Hsu-Hsing
Institute of Physics, Academia Sinica, Taipei 115, Taiwan, R.O.C.
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Tsong Tien
Institute of Physics, Academia Sinica, Taipei 115, Taiwan, R.O.C.
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