New Simulation Approach to Controlling Plasma Uniformities

スポンサーリンク

概要

• 論文の詳細を見る

• Plasma simulations have never been used for tool tuning in the field of semiconductor manufacturing because existing plasma simulations cannot inversely calculate input parameters such as power and gas distributions from output parameters such as the distribution of electron density $n_{\text{e}}$. One of the solutions is to reconstruct the framework of simulations as an inverse problem. A new simulation system has been developed as the first step. It has two key points. One is to introduce a power coupling coefficient $a_{\text{p}}$ as an index of the tool tuning, and the other is to add some functions to inversely calculate $a_{\text{p}}$ from the target $n_{\text{e}}$ distribution. In the verification of a two-dimensional model, it is shown that the error between the distribution of $n_{\text{e}}$ calculated by a check simulation and the target is sufficiently small. Therefore, this approach can be one of the solutions to control plasma uniformities.

• 2011-08-25

著者

• Yasaka Yasuyoshi

  Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, Kobe 657-8501, Japan

• Yasaka Yasuyoshi

  Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, 1-1 Rokkodai, Nada, Kobe 657-8501, Japan

• Tsuji Akihiro

  Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, Kobe 657-8501, Japan

• Tsuji Akihiro

  Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, 1-1 Rokkodai, Nada, Kobe 657-8501, Japan

関連論文

• New Simulation Approach to Controlling Plasma Uniformities
• Simple Model to Inclusively Understand a Radiated Wave Field in Slot-Excited Microwave Plasmas
• Studies on Density Dependence of Charge Separation in a Direct Energy Converter Using Slanted Cusp Magnetic Field

スポンサーリンク