Precision Measurement of Sub-50 nm Linewidth by Stitching Double-Tilt Images

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概要

• 論文の詳細を見る

• In this paper we present a stitching double-tilt image method (SDTIM) to measure sub-50 nm linewidth and to evaluate the measurement uncertainty. The SDTIM employs a parallel image method using a tilt mechanism to obtain two side scans. Moreover, the stitching method is used for linewidth determination. Experiments were performed by atomic force microscopy (AFM) using an ultrasharp tip, whose radius is smaller than 5 nm. The sample rotation axis is set parallel to the top surface of the sample in order to reduce the problem of measurement position variation. Experimental results show that the developed SDTIM can be used with an uncertainty of less than 5 nm at a confidence level of 95%.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2010-06-25

著者

• Tzong-Shi Liu

  Department of Mechanical Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan

• Liou Huay-Chung

  Center for Measurement Standards, Industrial Technology Research Institute, Hsinchu 30011, Taiwan

• Pan Shan-Peng

  Center for Measurement Standards, Industrial Technology Research Institute, Hsinchu 30011, Taiwan

• Shan-Peng Pan

  Center for Measurement Standards, Industrial Technology Research Institute, Hsinchu 30011, Taiwan

• Huay-Chung Liou

  Center for Measurement Standards, Industrial Technology Research Institute, Hsinchu 30011, Taiwan

• Chen Chao-Chang

  Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan

• Jr-Rung Chen

  Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan

• Chao-Chang A.

  Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan

関連論文

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• Method for Determining the Angle in Two Dimension Nanoscale: Pitch Grating
• Grating Pitch Measurement Beyond the Diffraction Limit with Modified Laser Diffractometry
• Precision Measurement of Sub-50 nm Linewidth by Stitching Double-Tilt Images

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