Design and Fabrication of Multi-Aperture Plate for Multi-Ion Beam Patterning System
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概要
- 論文の詳細を見る
For the multi-ion beam patterning system, it is necessary to develop a multi-aperture plate with a beam-controllable aperture device for individual adjustment of multi-ion beams on the stage. It is important to select the appropriate material for the multi-aperture plate to confirm the durability against damage by ion beams since the multi-aperture is located under a relatively strong ion beam. To prepare the controllable aperture system on the bottom side of the multi-aperture plate, the materials must be suitable for the microfabrication process. From an experimental etching test of some candidate materials, a silicon substrate with a magnesium oxide coating was selected for the multi-aperture plate. The structure also includes a Mo mesh on the top surface to solve the surface charging problem caused by ion beams, resulting in improved ion beam penetration through the aperture. Finally, a beam-controllable aperture device was designed with embedded parallel electrodes for durable and stable beam control and fabricated by the silicon microfabrication process.
- 2010-06-25
著者
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Han Jin
School Of Mechanical Engineering Yonsei University
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Kim Tae-gon
School Of Materials Science And Engineering Seoul National University
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Byung-Kwon Min
School of Mechanical Engineering, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, Korea
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Sang Jo
School of Mechanical Engineering, Yonsei University, Seoul 120-749, Korea
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Young-Joo Kim
Center for Information Storage Device, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, Korea
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Choi Yeonsoon
Center for Information Storage Device, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, Korea
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Sang Jo
School of Mechanical Engineering, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, Korea
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Jin Han
School of Mechanical Engineering, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, Korea
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Tae-Gon Kim
School of Mechanical Engineering, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, Korea
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Yeonsoon Choi
Center for Information Storage Device, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, Korea
関連論文
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- Influence of the Microstructures on the Dielectric Properties of ZrTiO_4 Thin Films at Microwave-Frequency Range
- Design and Fabrication of Multi-Aperture Plate for Multi-Ion Beam Patterning System
- Crystallinity Dependence of Microwave Dielectric Properties in (Ba,Sr)TiO3 Thin Films