Manufacturability Analysis of a Micro-Electro-Mechanical Systems–Based Electron-Optical System Design for Direct-Write Lithography

概要

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Multiple-electron-beam–direct-write lithography is one promising candidate for next-generation lithography because of its high resolution and ability of maskless operation. To achieve the throughput for high-volume manufacturing, miniaturized electro-optics elements are utilized to drive massively parallel beams simultaneously. Fabrication errors and uniformity of the elements can be serious issues in multiple-beam systems. Traditionally, electron optical systems (EOSs) are assembled and tested directly after the elements are fabricated. The yield by this technique can degrade significantly with multiple beams. In this work, a new EOS design-to-manufacturing flow which takes fabrication errors into account before the assembly process is proposed. The errors and imperfect components can be clearly screened by rigorous electron trajectory simulation. The effectiveness of the proposed approach is demonstrated with an fabricated electron-optical-objective-lens subject to imperfect hole profiles and substrate topography. Simulation results indicate that its EOS performances are acceptable even with significant fabrication errors.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2010-06-25