Effects of Water Desorption from SiO2 Substrates on the Thickness of Manganese Oxide Diffusion Barrier Layer Formed by Chemical Vapor Deposition

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概要

• 論文の詳細を見る

• A manganese oxide (MnOx) diffusion barrier layer was formed by chemical vapor deposition (CVD) on SiO2 substrates with or without preannealing. The thickness dependence of the MnOx layer was investigated in relation to the desorption behavior of water vapor from the substrates. A good correlation was found between MnOx thickness and the amount of desorbed water vapor. It is necessary to control the amount of absorbed water in the substrate to form a thin MnOx barrier layer with good thickness reproducibility.

• The Japan Society of Applied Physicsの論文
• 2010-05-25

著者

• Junichi Koike

  Department of Materials Science, Tohoku University, Sendai 980-8579, Japan

• Shigetoshi Hosaka

  Technology Development Center, Tokyo Electron Ltd., Nirasaki, Yamanashi 407-0192, Japan

• Kenji Matsumoto

  Leading Edge Process Development Center, Tokyo Electron Ltd., Nirasaki, Yamanashi 407-0192, Japan

• Koji Neishi

  Department of Materials Science, Tohoku University, Sendai 980-8579, Japan

• Hitoshi Itoh

  Technology Development Center, Tokyo Electron Ltd., Nirasaki, Yamanashi 407-0192, Japan

• Hidenori Miyoshi

  Technology Development Center, Tokyo Electron Ltd., Nirasaki, Yamanashi 407-0192, Japan

• Hiroshi Sato

  Technology Development Center, Tokyo Electron Ltd., Nirasaki, Yamanashi 407-0192, Japan

関連論文

• Selective Formation of a SnO2 Cap Layer, Its Growth Behavior, and Oxidation Resistance
• Effects of Water Desorption from SiO2 Substrates on the Thickness of Manganese Oxide Diffusion Barrier Layer Formed by Chemical Vapor Deposition

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