Extraction of Drain Current and Effective Mobility in Epitaxial Graphene Channel Field-Effect Transistors on SiC Layer Grown on Silicon Substrates
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概要
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We have fabricated and characterized field-effect transistors (FETs) with an epitaxial graphene channel on a SiC layer grown on a Si substrate. Epitaxial graphene can be formed on SiC substrates by thermal decomposition of its surface under an ultrahigh-vacuum (UHV) condition. To incorporate the thermal decomposition of SiC on Si substrates, we used an approach of growing a thin 3C-SiC(111) layer on Si substrates and subsequently annealing them in UHV to form graphene on the surface of the 3C-SiC layer. Backgate-field-effect transistors using the SiC layer as a gate insulator were characterized. Although a large amount of gate-leakage current is observed, the drain current modulation by backgate voltage is confirmed by extracting the channel current from the total drain current. The extracted channel current characteristics also suggest that the extracted effective mobility exceeds the universal mobility of bulk silicon under similar circumstances.
- 2010-04-25
著者
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Hiroyuki Handa
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Hyun-Chul Kang
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Kang Hyun-Chul
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Olac-vaw Roman
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Karasawa Hiromi
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Yu Miyamoto
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Tetsuya Suemitsu
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Hirokazu Fukidome
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Maki Suemitsu
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Taiichi Otsuji
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Roman Olac-vaw
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Hiromi Karasawa
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Kang Hyun-Chul
Research Institute of Electrical Communication (RIEC), Tohoku University, Sendai 980-8577, Japan
関連論文
- Ambipolar Behavior in Epitaxial Graphene-Based Field-Effect Transistors on Si Substrate
- Room Temperature Logic Inverter on Epitaxial Graphene-on-Silicon Device
- Erratum: “Extraction of Drain Current and Effective Mobility in Epitaxial Graphene Channel Field-Effect Transistors on SiC Layer Grown on Silicon Substrates”
- Extraction of Drain Current and Effective Mobility in Epitaxial Graphene Channel Field-Effect Transistors on SiC Layer Grown on Silicon Substrates