Tungsten Oxide Resistive Memory Using Rapid Thermal Oxidation of Tungsten Plugs
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概要
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A complementary metal oxide semiconductor (CMOS)-compatible WOx based resistive memory has been developed. The WOx memory layer is made from rapid thermal oxidation of W plugs. The device performs excellent electrical properties. The switching speed is extremely fast (${\sim}2$ ns) and the programming voltage (${<}1.4$ V) is low. For single-level cell (SLC) operation, the device shows a large resistance window, and $10^{8}$-cycle endurance. For multi-level cell (MLC) operation, it demonstrates 2-bit/cell storage with the endurance up to 10000 times. The rapid thermal oxidation (RTO) WOx resistance random access memory (RRAM) is very promising for both high-density and embedded memory applications.
- 2010-04-25
著者
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Chen Yi-Chou
Macronix Emerging Central Laboratory, Macronix International Co., Ltd., Hsinchu 300, Taiwan, R.O.C.
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Shih-Chang Tsai
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Yen-Hao Shih
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Chien Wei-Chih
Macronix Emerging Central Laboratory, Macronix International Co., Ltd., Hsinchu 300, Taiwan, R.O.C.
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Erh-Kun Lai
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Lai Erh-Kun
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Tian-Jue Hong
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Yu-Yu Lin
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Kuo-Pin Chang
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Yeong-Der Yao
Department of Physics and Institute of Applied Science and Engineering, Fu Jen University, Taipei 242, Taiwan, R.O.C.
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Pang Lin
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 300, Taiwan, R.O.C.
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Sheng-Fu Horng
Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 300, Taiwan, R.O.C.
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Jeng Gong
Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 300, Taiwan, R.O.C.
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Ching-Hsiung Lee
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Sheng-Hui Hsieh
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Chun-Fu Chen
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Kuang-Yeu Hsieh
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Rich Liu
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
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Chih-Yuan Lu
Macronix International Co., Ltd., 16 Li-Hsin Road, Science Park, Hsinchu 300, Taiwan, R.O.C.
関連論文
- Tungsten Oxide Resistive Memory Using Rapid Thermal Oxidation of Tungsten Plugs
- Evaluation of the WOx Film Properties for Resistive Random Access Memory Application