Periodic GaAs Convex and Hole Arrays Produced by Metal-Assisted Chemical Etching
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概要
- 論文の詳細を見る
Periodically ordered GaAs convex and hole arrays were fabricated through a combination of colloidal crystal templating and metal-assisted chemical etching using an ion-sputtered Pt–Pd catalyst. A change in the hydrofluoric acid concentration in the etchant results in different morphologies of hole arrays, such as circular and hexagonal holes. Pt–Pd-assisted chemical etching realizes an etching structure having an aspect ratio that is better than those realized by Ag-, Pd-, and Au-assisted chemical etching. GaAs undergoing Pt–Pd-assisted chemical etching exhibited anisotropy of the etching rates with respect to the two-dimensional crystallography of the substrate.
- 2010-11-25
著者
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Ono Sachiko
Department Of Applied Chemistry Faculty Of Engineering Kogakuin University
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Asoh Hidetaka
Department Of Applied Chemistry Kogakuin University
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Asoh Hidetaka
Department of Applied Chemistry, Faculty of Engineering, Kogakuin University, 2665-1 Nakano, Hachioji, Tokyo 192-0015, Japan
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Yasukawa Yukiko
Research Institute for Science and Technology, Kogakuin University, 2665-1 Nakano, Hachioji, Tokyo 192-0015, Japan
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Ono Sachiko
Department of Applied Chemistry, Faculty of Engineering, Kogakuin University, 2665-1 Nakano, Hachioji, Tokyo 192-0015, Japan
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