Actinic Mask Blank Inspection and Signal Analysis for Detecting Phase Defects Down to 1.5 nm in Height
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概要
- 論文の詳細を見る
The capability of an actinic (at-wavelength) inspection system for extreme ultraviolet lithography (EUVL) mask blank has been analyzed by experiment and simulation. The actinic inspection optics, that we developed to obtain a two-dimensional dark field image, consists of illumination optics, Schwarzschild optics with concave and convex mirrors as dark-field imaging optics, and a back-illuminated charge-coupled-device (BI-CCD). A test mask blank with programmed bump defects of smaller sizes and lower heights compared to those used in a previous work was fabricated and the bump defects were detected by the tool. The inspection experiments demonstrated that fabricated multilayer defects down to 1.5 nm in top height and 60 nm in width can be successfully detected. The simulation further indicated that the inspection optics performed well in detecting phase defects of 1.5 nm in height and 40 nm in width.
- 2009-06-25
著者
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TERASAWA Tsuneo
MIRAI, Association of Super-Advanced Electronics Technologies
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Tanaka Toshihiko
MIRAI-Association of Super-Advanced Electronics Technologies, 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Suga Osamu
MIRAI–Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Yamane Takeshi
MIRAI–Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Iwasaki Teruo
MIRAI–Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Tomie Toshihisa
National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Yamane Takeshi
MIRAI–Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Tanaka Toshihiko
MIRAI–Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Iwasaki Teruo
MIRAI–Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Terasawa Tsuneo
MIRAI–Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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