Improved Micro-Photopatterning on Azo Film for a Practical Nematic Liquid Crystal Bistability

概要

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A surface bistable liquid crystal cell and its photolithographic fabrication process were improved toward practical applications. The exposure time for preparing the aligning pattern was reduced from 35 min in our previous study to 400 s by employing a low-molecular-weight azo compound with a higher photosensitivity (${<}1$ J/cm2). The contrast ratio was enhanced from $6:1$ in the previous study to $27:1$ by reducing the domain size from $2\times 2$ to $1\times 1$ μm2. In view of the conspicuous deviation of the resultant micropattern from the ideal checker form, we discuss the geometric conditions for surface bistability in two-dimensional periodic patterns.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2009-04-25