New Approach to Fabrication of Minute Columnar and Ring Patterns with ZnS, SiO2, and Zn

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概要

• 論文の詳細を見る

• Minute columnar and ring patterns are fabricated by heat-mode lithography, in which a mixed thin film consisting of zinc sulfide (ZnS), silicon dioxide (SiO2), and zinc (Zn) is used. This single layer has an optical absorption ability and simultaneously shows etching resistance change. Smooth submicrometer-scale ring arrays are fabricated by a unique two-step method. First, an ablation hole is formed by irradiating pulsed laser light, and then a ring pattern is formed by removing the outer regions by wet etching. Optically transparent patterns are also fabricated using an oxidizable light-absorption material of Zn, which changes to zinc oxide (ZnO) following laser irradiation.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2009-01-25

著者

• Mori Tetsuji

  Imaging Technology Development Center, Corporate Technology Development Group, RICOH Co., Ltd., 16-1 Shinei-cho, Tsuzuki-ku, Yokohama 224-0035, Japan

関連論文

• New Approach to Fabrication of Minute Columnar and Ring Patterns with ZnS, SiO2, and Zn

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