Study of Aluminum Film Deposition on the Surface of Micro-Trench by Dual Ion Beam Sputtering

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概要

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• In order to develop functions of a system and/or reduce the sizes and the volumes, increasing surface areas per unit volume of a device, such as a capacitor or a gas sensor, becomes one of the solutions and can enhance the performance. Therefore, the formation of micro-structured holes or micro-trenches is one method to increase the ratio of the surface area to the volume. Film deposition on the surface of micro-structures has been widely and urgently for semiconductor application or microelectromechanical systems (MEMS) processes. Continuity and uniformity are very important characteristics for a thin film on the micro-structures since any discontinuous film would result in poor performance. In the current study, dual ion beams were firstly used to deposit film on the surface of micro-trenches. According to the results, the dual ion beam system shows good step coverage and uniformity of film on the micro-trench.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2008-06-25

著者

• Tsai Hung-Yin

  Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, Taiwan 300, R.O.C.

• Kuo Kei-Lin

  Department of Vehicle Engineering, National Taipei University of Technology, Taipei, Taiwan 106, R.O.C.

• Wu Chih-Wei

  Department of Mechanical and Mechatronic Engineering, National Taiwan Ocean University, Keelung, Taiwan 202, R.O.C.

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• Study of Aluminum Film Deposition on the Surface of Micro-Trench by Dual Ion Beam Sputtering

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