Lock-in Pixel Using a Current-Assisted Photonic Demodulator Implemented in 0.6 μm Standard Complemetary Metal–Oxide–Semiconductor
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概要
- 論文の詳細を見る
A complemetary metal–oxide–semiconductor (CMOS) lock-in pixel sensor based on a current-assisted photonic demodulation (CAPD) detector is described. The CAPD detector provides high demodulation contrast and yields excellent photo-response. The prototype followed standard active pixel sensor (APS) architecture and was fabricated using a 0.6 μm CMOS process from AMS. We obtained a near infrared (NIR) light responsivity of 0.26 A/W at 860 nm. The pixel exhibits demodulation contrast of nearly 100% at low frequencies and above 90% even up to 2 MHz. The phase response is linear up to 2 MHz, and even up to 10 MHz with the appropriate phase extraction equations.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-04-30
著者
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Grootjans Riemer
Vrije Universiteit Brussel Laboratory For Micro- & Photonelectronics (lami)
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KUIJK Maarten
Vrije Universiteit Brussel, Laboratory for Micro- & Photonelectronics (LAMI)
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Van Nieuwenhove
Vrije Universiteit Brussel Laboratory For Micro- & Photonelectronics (lami)
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Van Der
Vrije Univ. The Netherlands
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van der
Vrije Universiteit Brussel, Department of Electronics and Informatics ETRO/LAMI, Pleinlaan 2, 1050 Brussels, Belgium
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Kuijk Maarten
Vrije Universiteit Brussel, Department of Electronics and Informatics ETRO/LAMI, Pleinlaan 2, 1050 Brussels, Belgium
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- Lock-in pixel using a Current-assisted photonic demodulator Implemented in 0.6μm Standard CMOS
- Lock-in Pixel Using a Current-Assisted Photonic Demodulator Implemented in 0.6 μm Standard Complemetary Metal–Oxide–Semiconductor