The Impact of Fabrication Errors on a Flat-Top Grating-Based Planar Waveguide Demultiplexer
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概要
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The spectral performance of a demultiplexer is significantly affected by the phase and amplitude errors due to fabrication errors. We estimate the impact of fabrication errors on a flat-top grating-based planar waveguide demultiplexer using a design example. Simulation results show that the photomask resolution resulting in a phase error should be lower than 40 nm when a crosstalk criterion of $-30$ dB is given. The impact of amplitude errors is not distinct until the reduced amount of the facet width is greater than 0.5 μm and the grating side-wall angle offset from the vertical is larger than 1°.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-11-15
著者
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Huang Yang-tung
Department Of Electrical Engineering National Sun Yat-sen University
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Lin Chun-ting
Department Of Animal Science National Chung Hsing University
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Huang Yang-Tung
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University, Hsinchu 30010, Taiwan
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Lin Chun-Ting
Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan
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Huang Jung-Yaw
Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan
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