Fresnel-Zone-Plate-Magnified X-ray Topography
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概要
- 論文の詳細を見る
This paper describes submicron-resolution X-ray topography using a Fresnel zone plate (FZP). A diffraction image was expanded by an FZP and focused onto a four-quadrant slit, through which X-ray intensity was measured. Topographs were obtained by moving a sample in two dimensions. A local strain analysis of oxide-patterned silicon provided a spatial resolution of less than 0.5 μm and a strain sensitivity of $7 \times 10^{-6}$ at a photon energy of 8.5 keV. Unlike microbeam X-ray diffraction analysis, this method is free from diffraction-limit constraint.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-06-15
著者
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Kubo Toshikazu
Fuji Electric Advanced Technology Co. Ltd.
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Tanuma Ryohei
Fuji Electric Advanced Technology Co., Ltd., 1 Fuji-machi, Hino, Tokyo 191-8502, Japan
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Kubo Toshikazu
Fuji Electric Advanced Technology Co., Ltd., 1 Fuji-machi, Hino, Tokyo 191-8502, Japan
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