Fabrication of Polymer Inverse Opals on Substrate by Transfer Technique
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概要
- 論文の詳細を見る
Polymer inverse opals have been fabricated with good replication fidelity on a polymer substrate by the transfer technique, in which self-assembled silica opals on a quartz substrate were used as templates. Transferred polymer inverse opals showed a smaller contraction of the original periodicity than the conventional self-standing inverse opals. In addition, the standard deviation value of the wavelengths at the photonic band gap for the trasnsferred polymer inverse opals is almost the same as that of silica opals which are used as templates, whereas that of self-standing inverse opals is larger. The film thickness dependance of the maximum attenuations of photonic band gap, $10 \log$ (transmission minimum/transmission maximum), showed that polymer inverse opals are modulated more strongly than silica opals.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-05-15
著者
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Hino Takeshi
1st Research Department, Tohoku R&D Center, Research and Development Group, RICOH Co., Ltd., 5-10 Yokarakami, Kumanodo, Takadate, Natori, Miyagi 981-1241, Japan
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Mori Tetsuji
Memory System Research Department, Advanced Technology R&D Center, Research and Development Group, RICOH Co., Ltd., 16-1 Shinei-cho, Tsuzuki-ku, Yokohama 224-0035, Japan
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Fuse Akihiro
1st Research Department, Tohoku R&D Center, Research and Development Group, RICOH Co., Ltd., 5-10 Yokarakami, Kumanodo, Takadate, Natori, Miyagi 981-1241, Japan
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Fuse Akihiro
1st Research Department, Tohoku R&D Center, Research and Development Group, RICOH Co., Ltd., 5-10 Yokarakami, Kumanodo, Takadate, Natori, Miyagi 981-1241, Japan