Oxygen-Plasma Treatment of Indium–Tin Oxide in a Triode Glow Discharge

スポンサーリンク

概要

• 論文の詳細を見る

• An indium–tin oxide (ITO) surface was treated with oxygen (O2) plasma in a triode glow discharge system. The processing time and the radio frequency (rf) voltage applied to the substrate electrode were changed. The contact angle, X-ray photoelectron spectroscopy (XPS) spectra and scanning electron microscopy (SEM) image of the O2-plasma-treated ITO surface, and the characteristics of organic electroluminescence (EL) devices fabricated on O2-plasma-treated ITO were investigated. By applying an rf voltage of 200 V, contact angle decreased from 35 to 11°, the concentration ratio of C 1s/In 3d decreased, that of O 1s/In 3d increased, and the operating voltage of the EL devices decreased.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2006-10-30

著者

• Kudo Yusuke

  Faculty Of Engineering Osaka City University

• Kusabiraki Minoru

  Faculty of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi-ku, Osaka 558-8585, Japan

関連論文

• Oxygen-Plasma Treatment of Indium–Tin Oxide in a Triode Glow Discharge

スポンサーリンク