Influence of Diffusion on Properties of 173 nm Light Emission from Discharge Cells in Plasma Display Panel

概要

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A simple analytical expression $Y$ of the 173 nm emission intensity is described in terms of the diffusion loss $d_{\text{f}}$, the three-body collision $ \eta $, the gas pressure $ p$ and the xenon mole fraction $ \chi $. The emission intensity $Y$ of 173 nm photons decreases with increasing parameter $d_{\text{f}}$. Moreover, $Y$ increases rapidly with the gas pressure $ p$ and the xenon mole fraction $ \chi $. Results from the theoretical model agree markedly well with experimental data.
2005-09-15