Hydrogen Dissociation from Mg-doped GaN
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概要
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We have investigated the thermal activation process of Mg dopant in Mg-doped GaN by secondary ion mass spectrometry (SIMS) and Hall measurement with the van der Pauw configuration. We have found a systematic relationship between the amount of the hydrogen dissociated from the Mg-doped GaN layer by thermal annealing and the electronic conductive properties of the layer, i.e., Hall mobility, Hall carrier density and resistivity of the layer. The hydrogen in the Mg-doped GaN layer has been classified into at least two different modes. The first mode involves relatively larger activation energy of the dissociation process from the Mg-doped GaN layer, and the dissociation energy from the Mg-doped GaN to the atmosphere is 0.8–1.5 eV. The second mode has the dissociation energy of 0.2–0.5 eV. The former mode may be associate with the hydrogen passivation of the Mg dopant in GaN and the latter one may be closely related to the passivation of the electrical compensation mechanism for the positive hole carriers in the Mg-doped GaN.
- 2004-01-15
著者
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HARAGUCHI Masanobu
The University of Tokushima, Faculty of Engineering, Optical Science and Technology Department
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FUKUI Masuo
The University of Tokushima, Faculty of Engineering, Optical Science and Technology Department
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Mukai T
Nichia Corp. Tokushima Jpn
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Nakagawa Yoshinori
The University Of Tokushima Faculty Of Engineering Optical Science And Technology Department
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Morioka Yasushi
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Tanaka S
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Sakaki A
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Kususe K
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Hosokawa N
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Takehara T
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Morioka Y
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Iijima H
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Kubota M
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Abe M
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Takagi H
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Shinomiya G
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Kususe Ken
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Sakaki Atsushi
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Nakagawa Yoshinori
The University of Tokushima, Faculty of Engineering, Optical Science and Technology Department, 2-1 Minami-josanjima Tokushima 770-8506, Japan
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Mukai Takashi
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Haraguchi Masanobu
The University of Tokushima, Faculty of Engineering, Optical Science and Technology Department, 2-1 Minami-josanjima Tokushima 770-8506, Japan
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Abe Masatoshi
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Kubota Masaru
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Takehara Takae
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Takagi Hironori
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Fukui Masuo
The University of Tokushima, Faculty of Engineering, Optical Science and Technology Department, 2-1 Minami-josanjima Tokushima 770-8506, Japan
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Hosokawa Naoki
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Iijima Hiroshi
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
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Shinomiya Gen-ichi
Nichia Corporation, 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan
関連論文
- Hydrogen Dissociation from Mg-doped GaN
- Hydrogen Dissociation from Mg-doped GaN
- Misfit Dislocation Generation in InGaN Epilayers on Free-Standing GaN