Amorphous Avalanche Photodiode with Large Conduction Band Edge Discontinuity
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概要
- 論文の詳細を見る
An amorphous avalanche photodiode (APD) with a heterojunction of hydrogenated amorphous silicon carbide (a-SiC:H) and hydrogenated amorphous silicon germanium (a-SiGe:H) was formed. The band gaps of a-SiC:H and a-SiGe:H are 3.5 eV and 1.55 eV, respectively. The discontinuity of conduction bands at the heterojunction is larger than the band gap of a-SiGe:H. In this amorphous APD, photocurrent multiplication is observed under low electric field. The quantum efficiency starts to exceed unity when the conduction band discontinuity becomes larger than the band gap of a lower-gap material, and it is likely to saturate at 2. The slope of photoelectric conversion characteristics is 1.00. The multiplication is explained by the impact ionization process at the band edge discontinuity region.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1996-02-28
著者
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Sugawa Shigetoshi
Device Development Center Canon Inc.
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Tokunaga Hiroyuki
Device Development Center Canon Inc.
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Atoji Tadashi
Device Development Center Canon Inc.
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Ohmi Kazuaki
Device Development Center Canon Inc.
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Shimizu Hisae
Device Development Center Canon Inc.
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Kozuka Hiraku
Device Development Center Canon Inc.
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Kozuka Hiraku
Device Development Center, Canon Inc., 6770 Tamura, Hiratsuka-shi, Kanagawa 254, Japan
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Shimizu Hisae
Device Development Center, Canon Inc., 6770 Tamura, Hiratsuka-shi, Kanagawa 254, Japan
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Tokunaga Hiroyuki
Device Development Center, Canon Inc., 6770 Tamura, Hiratsuka-shi, Kanagawa 254, Japan
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Sugawa Shigetoshi
Device Development Center, Canon Inc., 6770 Tamura, Hiratsuka-shi, Kanagawa 254, Japan
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Ohmi Kazuaki
Device Development Center, Canon Inc., 6770 Tamura, Hiratsuka-shi, Kanagawa 254, Japan
関連論文
- An Amorphous Avalanche Photo-Diode with a Large Conduction Band Edge Discontinuity
- Amorphous Avalanche Photodiode with Large Conduction Band Edge Discontinuity