Plasma Processing Control by a Magnetic Field Crossed to a Sheath Electric Field

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概要

• 論文の詳細を見る

• This paper deals with a theoretical concept and method of control in plasma processing technologies. Its aim is the selection of ion species and the control of ion kinetic energy bombarding a substrate electrode. The selection and the control are practised within the sheath between the electrode and a DC or rf discharge plasma by applying an external magnetic field crossed to the sheath electric field.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 1989-09-20

著者

• Tanizuka Noboru

  Integrated Arts & Sciences, University of Osaka Prefecture

• Tanizuka Noboru

  Integrated Arts and Sciences, University of Osaka Prefecture, Mozu-Umemachi, Sakai 591

関連論文

• NATURES ON THE FLUCTUATIONS OF THE INTENSITY OF MICROWAVE FROM TWENTY EIGHT QUASARS(Session I : Cross-Disciplinary Physics, The 1st Tohwa University International Meeting on Statistical Physics Theories, Experiments and Computer Simulations)
• Discharge Plasma and Sheath as a Stochastic Process : What the |f|^ Power Spectral Law Implies
• Plasma Processing Control by a Magnetic Field Crossed to a Sheath Electric Field

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